What exactly is the failure mode you are experiencing?

-----Original Message-----
From: mems-talk-bounces+dan.ruiz=honeywell.com@memsnet.org
[mailto:mems-talk-bounces+dan.ruiz=honeywell.com@memsnet.org] On Behalf
Of li shifeng
Sent: Wednesday, March 10, 2010 4:44 PM
To: mems-talk@memsnet.org
Subject: [mems-talk] Au lift off

Hi, All,

I pattened 100nm lines on the glass substrate. The height of the line is
around 250nm. I used an e-beam evaportor to deposit 5nm Ti and 80nm Au.
I found it is very hard to lift off. What are the possible reasons?  Any
suggestions to succeed with an Au lift off process for smaller patterns?

Thanks!

Shifeng